Revision as of 21:39, 1 December 2021 (view source) Mfortman2 (talk \| contribs) (Created page with "{\| class="wikitable" \|+Unaxis 790 RIE \|- ! User !! Date !! Recipe !! Material !! Thickness !! Time !! Etch Rate !Comments \|- \| Ex \|\| 04/02/19 \|\| NbEtch \|\| Nb \|\| 40nm \|\| 30 s \|...")		Revision as of 21:50, 1 December 2021 (view source) Mfortman2 (talk \| contribs) No edit summary Tag: Visual edit Newer edit →
{\| class="wikitable" \|+Fiji ALD ~~\|+Unaxis 790 RIE~~ \|- ! User !! Date !! Recipe !! Material !! Nominal Thickness ~~!! Time !! Etch Rate~~ !Measured Thickness !Comments \|- ~~\| Ex \|\| 04/02/19 \|\| NbEtch \|\| Nb \|\| 40nm \|\| 30 s \|\| 80 nm/m~~ \| \|- \|MF \|108/2723/21 \|NbN 350C - Plasma - Bubble - Plasma Clean ~~\|NbEtch~~ \|NbN ~~\|Nb on junctions~~ \|40 nm ~~\|90~~ ~~\|195 s~~ \| \| \|- \| MF \|\| 11/17/21 \|\| NbN 350C - Plasma - Bubble - Plasma Clean \|\| NbN \|\| 40 nm ~~\|JS~~ \|39-43 nm ~~\|11/10/21~~ \|4 tips chip, PtIr STM tip in holder (masked to electrically isolate), 5 Si chips ~~\|50_10_10~~ ~~\|PMMA/Neutral Layer/Graphene/SiO2/Si~~ \| ~~\|10~~ ~~\|N/A Descum~~ \| \|- ~~\|MF~~ ~~\|11/22/21~~ ~~\|NbEtch~~ ~~\|Nb wire~~ \| ~~\|100 minutes~~ \| ~~\|4 wires in Mo holder~~ \|- ~~\|MF~~ ~~\|12/1/21~~ ~~\|50CHF3~~ ~~\|SiO2~~ ~~\|<200nm~~ ~~\|11.75 minutes~~ \| ~~\|Test sample for PECVD dep rate~~ \|- \|}

ALD: Difference between revisions

ALD (view source)