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ALD: Difference between revisions
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(Created page with "{| class="wikitable" |+Unaxis 790 RIE |- ! User !! Date !! Recipe !! Material !! Thickness !! Time !! Etch Rate !Comments |- | Ex || 04/02/19 || NbEtch || Nb || 40nm || 30 s |...") |
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{| class="wikitable"
|+Fiji ALD
|-
! User !! Date !! Recipe !! Material !! Nominal Thickness
!Measured Thickness
!Comments
|-
|MF
|3/22/21
|NbN 300C - Plasma
|NbN
|30 nm
|
|3 Si chips
|-
|MF
|
|NbN 300C - Plasma w boost
|NbN
|40 nm
|▼
|
|Error in recipe
|-
|
|
|NbN 300C - Plasma - Bubble - Plasma Clean
|NbN
|40 nm
|
|1 W STM tip in holder, 6 Si chips
|-
|MF
|
|NbN 350C - Plasma - Bubble - Plasma Clean
|NbN
|40 nm
|37,39,41 nm
|2 W STM tips in holders, 5 Si chips
▲|-
| MF || 11/17/21 || NbN 350C - Plasma - Bubble - Plasma Clean || NbN || 40 nm
|39-43 nm
|4 tips chip, PtIr STM tip in holder (masked to electrically isolate), 5 Si chips
|-
|MF
|12/
|NbN 350C - Plasma - Bubble - Plasma Clean
|NbN
|40 nm
|
|2 13x13mm Si chips, etc.
|-
|}
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