PECVD: Difference between revisions

Jump to navigation Jump to search
105 bytes added ,  6 December 2021
no edit summary
No edit summary
No edit summary
 
(One intermediate revision by the same user not shown)
|SiO2
|333 seconds
|200nm
|190 nm
|.57 nm/s
|20211122 test sample to determine dep rate
|-
|MF
|12/6/21
|SiOxide2
|SiO2
|350 seconds
|200nm
|
|
|20211122 test20210922A sample to determinefor depNb ratejunctions
|-
|}
25

edits

Navigation menu