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(Created page with "{| class="wikitable" |+ Caption text |- ! User !! Date !! Recipe !! Material !! Thickness !! Time !! Etch Rate |- | Ex || 04/02/19 || NbEtch || Nb || 40nm || 30 secs || 80 nm/...") |
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{| class="wikitable"
|+Unaxis 790 RIE
|-
! User !! Date !! Recipe !! Material !! Thickness !! Time !! Etch Rate
!Comments
|-
| Ex || 04/02/19 || NbEtch || Nb || 40nm || 30
|
|-
|MF
|10/27/21
|NbEtch
|Nb on junctions
|90
|195 s
|
|
|-
|JS
|11/10/21
|50_10_10
|PMMA/Neutral Layer/Graphene/SiO2/Si
|
|10
|N/A Descum
|
|-
|MF
|11/22/21
|NbEtch
|Nb wire
|
|100 minutes
|
|4 wires in Mo holder
|-
|MF
|12/1/21
|50CHF3
|SiO2
|<200nm
|11.75 minutes
|
|Test sample for PECVD dep rate
|-
|}
| |||