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| User | Date | Recipe | Material | Time | Nominal Thickness (nm) | Measured Thickness (nm) | Deposition rate | Comments |
|---|---|---|---|---|---|---|---|---|
| MF | 11/23/21 | SiOxide2 | SiO2 | 333 seconds | 200nm | 20211122 test sample to determine dep rate |
| User | Date | Recipe | Material | Time | Nominal Thickness (nm) | Measured Thickness (nm) | Deposition rate | Comments |
|---|---|---|---|---|---|---|---|---|
| MF | 11/23/21 | SiOxide2 | SiO2 | 333 seconds | 200nm | 20211122 test sample to determine dep rate |