PECVD

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Unaxis 790 RIE
User Date Recipe Material Thickness Time Etch Rate Comments
Ex 04/02/19 NbEtch Nb 40nm 30 s 80 nm/m
MF 10/27/21 NbEtch Nb on junctions 90 195 s
JS 11/10/21 50_10_10 PMMA/Neutral Layer/Graphene/SiO2/Si 10 N/A Descum
MF 11/22/21 NbEtch Nb wire 100 minutes 4 wires in Mo holder
MF 12/1/21 50CHF3 SiO2 <200nm 11.75 minutes Test sample for PECVD dep rate
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