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PECVD: Difference between revisions
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(Created page with "{| class="wikitable" |+Unaxis 790 RIE |- ! User !! Date !! Recipe !! Material !! Thickness !! Time !! Etch Rate !Comments |- | Ex || 04/02/19 || NbEtch || Nb || 40nm || 30 s |...") |
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{| class="wikitable"
|+Plasma-Therm 70 Series
|-
! User !! Date !! Recipe !! Material
!Time !! Nominal Thickness (nm) !! Measured Thickness (nm) !! Deposition rate
!Comments
|-
|MF
|
|SiOxide2
|SiO2▼
|333 seconds
|190 nm
|.57 nm/s
|20211122 test sample to determine dep rate
|-
|MF
|
|SiOxide2
|SiO2
|350 seconds
|200nm
|
▲|SiO2
▲|<200nm
|
|
|-
|}
| |||