PECVD

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Plasma-Therm 70 Series
User	Date	Recipe	Material	Time	Nominal Thickness (nm)	Measured Thickness (nm)	Deposition rate	Comments
MF	11/23/21	SiOxide2	SiO2	333 seconds	200nm	190 nm	.57 nm/s	20211122 test sample to determine dep rate

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