RIE: Difference between revisions
Jump to navigation
Jump to search
No edit summary |
No edit summary |
||
| Line 13: | Line 13: | ||
|195 s |
|195 s |
||
| |
| |
||
|- |
|||
|JS |
|||
|11/10/21 |
|||
|50_10_10 |
|||
|PMMA/Neutral Layer/Graphene/SiO2/Si |
|||
| |
|||
|10 |
|||
|N/A Descum |
|||
|- |
|- |
||
|} |
|} |
||
Revision as of 17:11, 11 November 2021
| User | Date | Recipe | Material | Thickness | Time | Etch Rate |
|---|---|---|---|---|---|---|
| Ex | 04/02/19 | NbEtch | Nb | 40nm | 30 s | 80 nm/m |
| MF | 10/27/21 | NbEtch | Nb on junctions | 90 | 195 s | |
| JS | 11/10/21 | 50_10_10 | PMMA/Neutral Layer/Graphene/SiO2/Si | 10 | N/A Descum |