PECVD: Difference between revisions
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|SiO2 |
|SiO2 |
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|333 seconds |
|333 seconds |
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|200nm |
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|190 nm |
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|.57 nm/s |
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|20211122 test sample to determine dep rate |
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|MF |
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|12/6/21 |
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|SiOxide2 |
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|SiO2 |
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|350 seconds |
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|200nm |
|200nm |
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|20210922A sample for Nb junctions |
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Latest revision as of 16:00, 6 December 2021
| User | Date | Recipe | Material | Time | Nominal Thickness (nm) | Measured Thickness (nm) | Deposition rate | Comments |
|---|---|---|---|---|---|---|---|---|
| MF | 11/23/21 | SiOxide2 | SiO2 | 333 seconds | 200nm | 190 nm | .57 nm/s | 20211122 test sample to determine dep rate |
| MF | 12/6/21 | SiOxide2 | SiO2 | 350 seconds | 200nm | 20210922A sample for Nb junctions |