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(Created page with "{| class="wikitable" |+Unaxis 790 RIE |- ! User !! Date !! Recipe !! Material !! Thickness !! Time !! Etch Rate !Comments |- | Ex || 04/02/19 || NbEtch || Nb || 40nm || 30 s |...") |
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{| class="wikitable" |
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|+Plasma-Therm 70 Series |
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|+Unaxis 790 RIE |
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! User !! Date !! Recipe !! Material |
! User !! Date !! Recipe !! Material |
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!Time !! Nominal Thickness (nm) !! Measured Thickness (nm) !! Deposition rate |
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!Comments |
!Comments |
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| Ex || 04/02/19 || NbEtch || Nb || 40nm || 30 s || 80 nm/m |
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|MF |
|MF |
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|11/23/21 |
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|SiOxide2 |
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|NbEtch |
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| ⚫ | |||
|Nb on junctions |
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|333 seconds |
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|90 |
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| ⚫ | |||
|195 s |
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|190 nm |
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|.57 nm/s |
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|20211122 test sample to determine dep rate |
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|JS |
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|11/10/21 |
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|50_10_10 |
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|PMMA/Neutral Layer/Graphene/SiO2/Si |
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|10 |
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|N/A Descum |
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|MF |
|MF |
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|12/6/21 |
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|SiOxide2 |
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|NbEtch |
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|SiO2 |
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|Nb wire |
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|350 seconds |
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|200nm |
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|100 minutes |
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|4 wires in Mo holder |
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|MF |
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|12/1/21 |
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|50CHF3 |
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| ⚫ | |||
| ⚫ | |||
|11.75 minutes |
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|20210922A sample for Nb junctions |
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Latest revision as of 16:00, 6 December 2021
| User | Date | Recipe | Material | Time | Nominal Thickness (nm) | Measured Thickness (nm) | Deposition rate | Comments |
|---|---|---|---|---|---|---|---|---|
| MF | 11/23/21 | SiOxide2 | SiO2 | 333 seconds | 200nm | 190 nm | .57 nm/s | 20211122 test sample to determine dep rate |
| MF | 12/6/21 | SiOxide2 | SiO2 | 350 seconds | 200nm | 20210922A sample for Nb junctions |