EBL: Difference between revisions
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! User !! Date |
! User !! Date |
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!Resist!! Dose ( |
!Resist!! Dose (µC/cm<sup>2</sup>) !! Write File !! Picture/Notes |
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| MF || 10/22/21 |
| MF || 10/22/21 |
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|junctionswshorts_bottom2c.dxf & junctionswshorts_top1.dxf |
|junctionswshorts_bottom2c.dxf & junctionswshorts_top1.dxf |
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|Redo other from 11/16/21 |
|Redo other from 11/16/21 |
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|GJ |
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|1/18/22 |
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|Bilayer 495A4/950A4, 4k RPM 60s, 180C bake 90s |
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|900-1500 |
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|p4720_1x1mm_pec.cel |
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p5590_1x1mm_pec.cel |
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|Dose array of 1x1mm thermal emitter patterns on EvapSi/Gr/SiO2/Au/Si |
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|GJ |
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|1/20/22 |
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|Bilayer 495A4/950A4, 4k RPM 60s, 180C bake 90s |
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|1100-1300 |
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|p4720_reduced_1x1mm_pec.cel & |
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p5580_reduced_1x1mm_pec.cel |
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|Repeated dose array in smaller range and reduced feature sizes to combat feature blowout |
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|GJ |
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|1/27/22 |
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|Bilayer 495A4/950A4, 4k RPM 60s, 180C bake 90s |
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|1300 |
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|p4720_reduced_4x4mm_pec.cel |
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|4x4mm thermal emitter pattern on sample MW2 Box 2 D2. Pattern was somehow written shifted by 2mm in x and y |
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Latest revision as of 16:43, 28 January 2022
| User | Date | Resist | Dose (µC/cm2) | Write File | Picture/Notes |
|---|---|---|---|---|---|
| MF | 10/22/21 | 950 spun at 4000RPM, 60s 180C bake | 2000 | bigtip_40um.dxf | Pattern for etching big (40um) tip |
| MF | 10/29/21 | Bilayer 495/950, 1800RPM, 60s 180C bake | 900 | junctions_200nm.dxf | 200nm break junctions |
| MF | 11/2/21 | 950 spun at 4000RPM, 60s 180C bake | 2000 | 4tips_40um.dxf | Pattern for etching a big tip (40um) at each corner |
| JS | 11/8/21 | 950 Spun at 4000 RPM, 90 sec 180 C Bake | 1500-3000 | Aligned_ribbons.dxf | 800 nm bars with 180 nm gaps for aligned BCP |
| MF | 11/10/21 | Bilayer 495/950, 1800RPM, 60s 180C bake | 900 | junctions_200nm.dxf | 200nm break junctions |
| JS | 11/11/21 | HSiQ: 3000 RPM | 1150 | SiN_40nm_Thermal_Wires | 40 nm wires with 2 micron gaps for SiN thermal steerer |
| MF | 11/16/21 | Bilayer 495/950, 1800RPM, 60s 180C bake | 900 | junctionswshorts2.dxf | 200nm break junctions w shorts on one side |
| MF | 11/29/21 | Bilayer 495/950, 1800RPM, 60s 180C bake | 900 | junctionswshorts_bottom2c.dxf & junctionswshorts_top1.dxf | Redo one from 11/16/21 |
| MF | 11/30/21 | Bilayer 495/950, 1800RPM, 60s 180C bake | 900 | junctionswshorts_bottom2c.dxf & junctionswshorts_top1.dxf | Redo other from 11/16/21 |
| GJ | 1/18/22 | Bilayer 495A4/950A4, 4k RPM 60s, 180C bake 90s | 900-1500 | p4720_1x1mm_pec.cel
p5590_1x1mm_pec.cel |
Dose array of 1x1mm thermal emitter patterns on EvapSi/Gr/SiO2/Au/Si |
| GJ | 1/20/22 | Bilayer 495A4/950A4, 4k RPM 60s, 180C bake 90s | 1100-1300 | p4720_reduced_1x1mm_pec.cel &
p5580_reduced_1x1mm_pec.cel |
Repeated dose array in smaller range and reduced feature sizes to combat feature blowout |
| GJ | 1/27/22 | Bilayer 495A4/950A4, 4k RPM 60s, 180C bake 90s | 1300 | p4720_reduced_4x4mm_pec.cel | 4x4mm thermal emitter pattern on sample MW2 Box 2 D2. Pattern was somehow written shifted by 2mm in x and y |