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! User !! Date
!Resist!! Dose (
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| MF || 10/22/21
| 950 spun at 4000RPM, 60s 180C bake|| 2000 || bigtip_40um.dxf || Pattern for etching big (40um) tip
|-
|MF
|10/29/21
|Bilayer 495/950, 1800RPM, 60s 180C bake
|▼
|900
|junctions_200nm.dxf
|MF
|11/2/21
|950 spun at 4000RPM, 60s 180C bake
|▼
|2000
|4tips_40um.dxf
|Aligned_ribbons.dxf
|800 nm bars with 180 nm gaps for aligned BCP
▲|-
|MF
|11/10/21
|Bilayer 495/950, 1800RPM, 60s 180C bake
|900
|junctions_200nm.dxf
|200nm break junctions
▲|-
|JS
|11/11/21
|HSiQ: 3000 RPM
|1150
|SiN_40nm_Thermal_Wires
|40 nm wires with 2 micron gaps for SiN thermal steerer
|-
|MF
|11/16/21
|Bilayer 495/950, 1800RPM, 60s 180C bake
|900
|junctionswshorts2.dxf
|200nm break junctions w shorts on one side
|-
|MF
|11/29/21
|Bilayer 495/950, 1800RPM, 60s 180C bake
|900
|junctionswshorts_bottom2c.dxf & junctionswshorts_top1.dxf
|Redo one from 11/16/21
|-
|MF
|11/30/21
|Bilayer 495/950, 1800RPM, 60s 180C bake
|900
|junctionswshorts_bottom2c.dxf & junctionswshorts_top1.dxf
|Redo other from 11/16/21
|-
|GJ
|1/18/22
|Bilayer 495A4/950A4, 4k RPM 60s, 180C bake 90s
|900-1500
|p4720_1x1mm_pec.cel
p5590_1x1mm_pec.cel
|Dose array of 1x1mm thermal emitter patterns on EvapSi/Gr/SiO2/Au/Si
|-
|GJ
|1/20/22
|Bilayer 495A4/950A4, 4k RPM 60s, 180C bake 90s
|1100-1300
|p4720_reduced_1x1mm_pec.cel &
p5580_reduced_1x1mm_pec.cel
|Repeated dose array in smaller range and reduced feature sizes to combat feature blowout
|-
|GJ
|1/27/22
|Bilayer 495A4/950A4, 4k RPM 60s, 180C bake 90s
|1300
|p4720_reduced_4x4mm_pec.cel
|4x4mm thermal emitter pattern on sample MW2 Box 2 D2. Pattern was somehow written shifted by 2mm in x and y
|}
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