Revision as of 21:34, 1 December 2021 (view source) Mfortman2 (talk \| contribs) (Created page with "{\| class="wikitable" \|+Unaxis 790 RIE \|- ! User !! Date !! Recipe !! Material !! Thickness !! Time !! Etch Rate !Comments \|- \| Ex \|\| 04/02/19 \|\| NbEtch \|\| Nb \|\| 40nm \|\| 30 s \|...")		Revision as of 21:38, 1 December 2021 (view source) Mfortman2 (talk \| contribs) No edit summary Tag: Visual edit Newer edit →
{\| class="wikitable" \|+Plasma-Therm 70 Series ~~\|+Unaxis 790 RIE~~ \|- ! User !! Date !! Recipe !! Material ~~!! Thickness !! Time !! Etch Rate~~ !Time !! Nominal Thickness (nm) !! Measured Thickness (nm) !! Deposition rate !Comments \|- ~~\| Ex \|\| 04/02/19 \|\| NbEtch \|\| Nb \|\| 40nm \|\| 30 s \|\| 80 nm/m~~ \| \|- \|MF \|1011/2723/21 \|SiOxide2 ~~\|NbEtch~~ \|SiO2▼ ~~\|Nb on junctions~~ \|333 seconds ~~\|90~~ \|<200nm▼ ~~\|195 s~~ \| \| \|~~Test~~20211122 test sample ~~for~~to ~~PECVD~~determine dep rate▼ \|- ~~\|JS~~ ~~\|11/10/21~~ ~~\|50_10_10~~ ~~\|PMMA/Neutral Layer/Graphene/SiO2/Si~~ \| ~~\|10~~ ~~\|N/A Descum~~ \| \|- ~~\|MF~~ ~~\|11/22/21~~ ~~\|NbEtch~~ ~~\|Nb wire~~ \| ~~\|100 minutes~~ \| ~~\|4 wires in Mo holder~~ \|- ~~\|MF~~ ~~\|12/1/21~~ ~~\|50CHF3~~ ▲\|SiO2 ▲\|<200nm ~~\|11.75 minutes~~ \| ▲\|Test sample for PECVD dep rate \|- \|}

PECVD: Difference between revisions

PECVD (view source)